Takumi D3A™ is aimed at improving mask yield, simplifying mask defect disposition and
reducing mask costs. Note that it takes as input either design layout (with criticality data)
or post-OPC layout. Of course, more is possible; Takumi D3A can load multiple files simultaneously. Plus, it handles both GDSII and OASIS physical layout.


               

Features

• Criticality aware
• Handle large data sizes
• Fast data streaming
• Smart layout analysis
• Multiple inspection formats
• Powerful image to shape engine
• Smart defect categorization
• Compatible with existing tools and methods

Benefits

• Improve mask yield
• Improve productivity
• Speed up communications between design and manufacturing teams
• Enhance inspection throughput
• Reduce defect disposition TAT
• Reduce mask costs

For more information, download our datasheet.