| NEWS |
| April 29, 2009 |
SOCcentral:
Takumi Technology Granted a Patent on System for Simplifying Layout Processing |
| September 2, 2008 |
SOCcentral:
The Shifting Landscape of DFM |
| June 4, 2008 |
Chip Design:
Takumi Tools to Support Automated Rule Enforcement |
| June 3, 2008 |
Si2:
Takumi Technology Joins Si2’s Design-For-Manufacturability Coalition |
| February 1, 2008 |
EETimes:
Takumi Technology named one of EETimes top 60 emerging startups |
| July 30, 2007 |
EETimes:
Minimizing layout hot spots at the 45-nm node |
| July 18, 2007 |
EDA Café:
Takumi Technology Named a Winner in Technology Innovation Showcase at SEMICON WEST 2007 |
| June 28, 2007 |
EETimes:
EE Times updates list of emerging startups |
| June 26, 2007 |
Reed Electronics:
Takumi Adds Automated Hot Spot Correction to DFM Toolset |
| June 9, 2007 |
EDA Design Line:
The EDA dozen |
| June 1, 2007 |
Takumi makes it to Gary Smith’s must see list at DAC 2007 |
| Febuary 28, 2007 |
EETimes Asia:
DNP, Takumi partner on photomask inspection |
| |
| PRESS RELEASES |
| May 12, 2009 |
Takumi Technology Granted Patent on Effective Proximity Effect Correction Methodology |
| April 29, 2009 |
Takumi Technology Granted a Patent on System for Simplifying Layout Processing |
| June 4, 2008 |
Takumi Expands Its Layout Optimization Tools to Support Automated Enforcement of Recommended Rules |
| September 19, 2007 |
Takumi Technology Teams With Chartered on DFM Optimization Technology |
| April 24, 2007 |
Renesas Technology Adopts Takumi Technology’s Layout Optimization Tools for Automatic Repair of Layout Hot Spots |
| April 9, 2007 |
Takumi Technology to Present Paper on Automatic Removal of Layout Hot Spots at Photomask Japan 2007 |
| Feburary 26, 2007 |
Dai Nippon Printing, Takumi Technology and a major semiconductor maker jointly developed automated criticality aware photo-mask inspection system |
| |
| EVENTS |
| September 30, 2008 |
Common Platform Technology Forum in Santa Clara, California
Come and join Takumi at booth 310.
|
| October 7-8, 2008 |
SPIE Photomask BACUS in Monterey, California
Visit Takumi at booth 415. Takumi will release two papers:
- DFM viewpoints of cell-level layout assessments and indications for concurrent layout optimization
- Flexible sensitivity inspection with TK-CMI software for criticality awareness
|
| February 22-27, 2009 |
SPIE Advanced Lithography in San Jose, California |
| April 8-10, 2009 |
Photomask Japan at the Yokohama Convention Center |
| July 26-31, 2009 |
DAC 2009 at the Moscone Convention Center
Join us at booth 1307.
|
| SUCCESS STORIES |
| April 24, 2007 |
Renesas Cuts 66% Off Their 65nm Library Development Schedule |
| |
| ARCHIVES |
| July 12, 2006 |
Takumi Technology Introduces Two New DFM Products for IC Layout Optimization |
| July 12, 2006 |
DFM startup targets 'hot spot' detection, repair |
| May 31, 2006 |
Takumi Technology Announces Partnership With Toshiba |
| May 31, 2006 |
Toshiba Collaborating with DFM Startup |
| May 1, 2006 |
SILICON ENGINEERING: DFM startup pinpoints a design's critical areas |
| April 20, 2006 |
Applied Materials-backed DFM startup emerges |
| April 19, 2006 |
Takumi Technology Announces Deployment of Criticality Aware Design Flow by NEC Electronics |
| January 18, 2006 |
SOMETHING VENTURED: Applied Materials Reinforces VC Fund |
