Layout Optimization for Yield and Performance

 News

 Press Releases

 Events

 Success Stories

 Archives
NEWS
April 29, 2009 SOCcentral:
Takumi Technology Granted a Patent on System for Simplifying Layout Processing
September 2, 2008 SOCcentral:
The Shifting Landscape of DFM
June 4, 2008 Chip Design:
Takumi Tools to Support Automated Rule Enforcement
June 3, 2008 Si2:
Takumi Technology Joins Si2’s Design-For-Manufacturability Coalition
February 1, 2008 EETimes:
Takumi Technology named one of EETimes top 60 emerging startups
July 30, 2007 EETimes:
Minimizing layout hot spots at the 45-nm node
July 18, 2007 EDA Café:
Takumi Technology Named a Winner in Technology Innovation Showcase at SEMICON WEST 2007
June 28, 2007 EETimes:
EE Times updates list of emerging startups
June 26, 2007 Reed Electronics:
Takumi Adds Automated Hot Spot Correction to DFM Toolset
June 9, 2007 EDA Design Line:
The EDA dozen
June 1, 2007 Takumi makes it to Gary Smith’s must see list at DAC 2007
Febuary 28, 2007 EETimes Asia:
DNP, Takumi partner on photomask inspection
 
PRESS RELEASES
May 12, 2009 Takumi Technology Granted Patent on Effective Proximity Effect Correction Methodology
April 29, 2009 Takumi Technology Granted a Patent on System for Simplifying Layout Processing
June 4, 2008 Takumi Expands Its Layout Optimization Tools to Support Automated Enforcement of Recommended Rules
September 19, 2007 Takumi Technology Teams With Chartered on DFM Optimization Technology
April 24, 2007 Renesas Technology Adopts Takumi Technology’s Layout Optimization Tools for Automatic Repair of Layout Hot Spots
April 9, 2007 Takumi Technology to Present Paper on Automatic Removal of Layout Hot Spots at Photomask Japan 2007
Feburary 26, 2007 Dai Nippon Printing, Takumi Technology and a major semiconductor maker jointly developed automated criticality aware photo-mask inspection system
 
EVENTS
September 30, 2008 Common Platform Technology Forum in Santa Clara, California

Come and join Takumi at booth 310.
October 7-8, 2008 SPIE Photomask BACUS in Monterey, California

Visit Takumi at booth 415. Takumi will release two papers:
  • DFM viewpoints of cell-level layout assessments and indications for concurrent layout optimization
  • Flexible sensitivity inspection with TK-CMI software for criticality awareness
February 22-27, 2009 SPIE Advanced Lithography in San Jose, California
April 8-10, 2009 Photomask Japan at the Yokohama Convention Center
July 26-31, 2009 DAC 2009 at the Moscone Convention Center
Join us at booth 1307.

SUCCESS STORIES
April 24, 2007 Renesas Cuts 66% Off Their 65nm Library Development Schedule
 
ARCHIVES
July 12, 2006 Takumi Technology Introduces Two New DFM Products for IC Layout Optimization
July 12, 2006 DFM startup targets 'hot spot' detection, repair
May 31, 2006 Takumi Technology Announces Partnership With Toshiba
May 31, 2006 Toshiba Collaborating with DFM Startup
May 1, 2006 SILICON ENGINEERING: DFM startup pinpoints a design's critical areas
April 20, 2006 Applied Materials-backed DFM startup emerges
April 19, 2006 Takumi Technology Announces Deployment of Criticality Aware Design Flow by NEC Electronics
January 18, 2006 SOMETHING VENTURED: Applied Materials Reinforces VC Fund